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목록AZ 400T Remover (1)
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[Photolithography] Negative resist: Spin-coating, baking, exposure and development conditions: AZ nLof 2020
[Photolithography] Negative resist: Spin-coating, baking, exposure and development conditions: AZ nLof 2020 One of the most commonly used negative photoresists is AZ nLof 2020. Here, I make a note on spin-coating, baking, exposure and development conditions of the negative tone photoresist. Useful links:Photoresist informaiton: http://www.microchemicals.com/products/photoresists/az_nlof_2020.htm..
연구자료
2016. 10. 17. 06:37